Fabrication of 100nm sized patterns on a non-planar substrate by using nanoimprinting lithography

Solid State Phenomena

Volumn 121-123, Issue PART 1, 2007, Pages 665-668

  Lee, H ^a   Huh, J Y ^a   Yang, K Y ^a   Hong, S ^a   Jung, G Y ^b  

^a Korea University   (South Korea)

^b HEWLETT PACKARD LABORATORIES   (United States)

Author keywords

Flexible template; Nano pattern duplication; Nano imprint lithography; Polymer template; Thermally curable monomer resin; UV curable monomer resin

Indexed keywords

MICROPROCESSOR CHIPS; NANOIMPRINT LITHOGRAPHY; ULTRAVIOLET RADIATION;

FLEXIBLE TEMPLATE; POLYMER TEMPLATE; THERMALLY CURABLE MONOMER RESIN; UV CURABLE MONOMER RESIN;

SUBSTRATES;

MICROPROCESSORS; SUBSTRATES; ULTRAVIOLET RADIATION;

EID: 34648814781     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/3-908451-30-2.665     Document Type: Conference Paper

References (4)

1. H. Lee and G-Y Jung: Japanese Journal of Applied Physics Vol. 43 (2004), p. 8369
2. C. D. Schaper, Nano Letters Vol. 3 (2003), p. 1305
3. H. Lee and G-Y Jung: Microelectronic Engineering Vol. 77 (2005), p. 168
4. H. Lee and G-Y Jung: Microelectronic Engineering Vol. 77 (2005), p. 42