Acceleration of deposition rates in a chemical vapor deposition process by laser irradiation

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 42, Issue 3 B, 2003, Pages

  Miyazaki, Hidetoshi ^a   Kimura, Teiichi ^a   Goto, Takashi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Continuous spectrum; High deposition rate; Langmuir probe

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM PREPARATION; LASER APPLICATIONS; LIGHT EMISSION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; ZIRCONIA;

DEPOSITION RATES; LASER IRRADIATION; PLANCK DISTRIBUTION; YTTRIA;

YTTRIUM COMPOUNDS;

EID: 0038022843     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.l316     Document Type: Letter

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