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Surface and Coatings Technology

Volumn 100-101, Issue 1-3, 1998, Pages 153-159

TiN films deposited by laser CVD: A growth kinetics study

(2) Silvestre, A J a Conde, O a

a UNIVERSITY OF LISBON (Portugal)

Author keywords

Coatings; Growth mechanisms; Laser chemical vapour deposition (LCVD); Titanium nitride (TiN)

Indexed keywords

ACTIVATION ENERGY; CARBON DIOXIDE LASERS; CARBON STEEL; CHEMICAL VAPOR DEPOSITION; COATINGS; FILM GROWTH; MASS TRANSFER; PYROLYSIS; REACTION KINETICS; SURFACE STRUCTURE; THICKNESS MEASUREMENT; THIN FILMS;

ARRHENIUS RELATION; ELECTRON PROBE MICROANALYSIS (EPMA); GLANCING INCIDENCE X RAY DIFFRACTION (GIXRD) ANALYSIS; LASER CHEMICAL VAPOR DEPOSITION (LCVD); LASER PROFILOMETERS;

TITANIUM NITRIDE;

EID: 0032022798 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(97)00606-3 Document Type: Article

Times cited : (14)

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