Morphology and preferred orientation of Y2O3 film prepared by high-speed laser CVD

Surface and Coatings Technology

Volumn 201, Issue 12, 2007, Pages 5776-5781

  Goto, Takashi ^a   Banal, Ryan ^a   Kimura, Teiichi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

81.15.Fg; 81.15.Gh; High speed deposition; Laser chemical vapor deposition; Morphology; Preferred orientation; Total gas pressure; Y2O3

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; FILMS; MORPHOLOGY; TEMPERATURE;

HIGH-SPEED DEPOSITION; LASER CHEMICAL VAPOR DEPOSITION; PREFERRED ORIENTATION; TOTAL GAS PRESSURE;

YTTRIUM COMPOUNDS;

CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; FILMS; MORPHOLOGY; TEMPERATURE; YTTRIUM COMPOUNDS;

EID: 33846572434     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.10.023     Document Type: Article

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