Epitaxial growth of TiN on Al2O3 at cryogenic temperature

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 42, Issue 2 B, 2003, Pages

  Chen, Wei Chuan ^a   Wu, Shinn Tyan ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Cryogenic temperature; Heteroepitaxy; Lattice mismatch; Pole figure; Reactive magnetron sputtering; Titanium nitride

Indexed keywords

EPITAXIAL GROWTH; FILM GROWTH; MAGNETRON SPUTTERING; SAPPHIRE; TEMPERATURE; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

CRYOGENIC TEMPERATURE; REACTIVE SPUTTERING; X RAY POLE FIGURE ANALYSIS; X RAY ROCKING CURVE;

ALUMINA;

EID: 0037442162     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.42.L192     Document Type: Letter

References (5)

1. M. Schneider, A. Rahman and I. K. Schuller: Phys. Rev. Lett. 55 (1985) 604.
2. V. Talyansky, S. Choopun, M. J. Downes, R. P. Sharma and T. Venkatesan: J. Mater. Res. 14 (1999) 3298.
3. W. C. Chen, Y. R. Lin, X. J. Guo and S. T. Wu: Jpn. J. Appl. Phys. 42 (2003) 208.
4. J. E. Greene and S. A. Barnett: J. Vac. Sci. & Technol. 21 (1982) 285.
5. K. Sano, M. Oose and T. Kawakubo: Jpn. J. Appl. Phys. 34 (1995) 3266.