On the effects of thermal treatment on the composition, structure, morphology, and optical properties of hydrogenated amorphous silicon-oxycarbide

Journal of Materials Research

Volumn 24, Issue 8, 2009, Pages 2561-2573

  Gallis, Spyros ^a,b   Nikas, Vasileios ^a   Eisenbraun, Eric ^a   Huang, Mengbing ^a   Kaloyeros, Alain E ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALED FILMS; ARGON ATMOSPHERES; EFFECTIVE CROSS SECTIONS; ER-DOPED; FOUR-ORDER; HYDROGENATED AMORPHOUS SILICON; MATRIX; MODELING STUDIES; NUCLEAR REACTION ANALYSIS; OPTICAL CHARACTERISTICS; OPTICAL EXCITATIONS; OPTIMIZED PROCESS; OXYCARBIDES; POST-DEPOSITION; PROCESSING CONDITION; ROOM-TEMPERATURE PHOTOLUMINESCENCE; THERMAL CHEMICAL VAPOR DEPOSITION; THERMAL TREATMENT; WAVELENGTH BAND;

AMORPHOUS SILICON; ARGON; ERBIUM; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEAT TREATMENT; HYDROGENATION; MORPHOLOGY; OPTICAL PROPERTIES; PHOTOEXCITATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE; SILICON OXIDES; SPECTROSCOPIC ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 70049105517     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2009.0308     Document Type: Article

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