Comparative study of the effects of thermal treatment on the optical properties of hydrogenated amorphous silicon-oxycarbide

Journal of Applied Physics

Volumn 102, Issue 2, 2007, Pages

  Gallis, Spyros ^a,b   Nikas, Vasileios ^a   Huang, Mengbing ^a   Eisenbraun, Eric ^a   Kaloyeros, Alain E ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NUCLEAR REACTION ANALYSIS; OPTICAL CHARACTERISTICS; OXYCARBIDE; THERMAL ANNEALING;

CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEAT TREATMENT; OPTICAL PROPERTIES; SILICON CARBIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS SILICON;

EID: 34547561281     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2753572     Document Type: Article

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