Photoluminescence in erbium doped amorphous silicon oxycarbide thin films

Applied Physics Letters

Volumn 87, Issue 9, 2005, Pages

  Gallis, Spyros ^a   Huang, Mengbing ^a   Efstathiadis, Harry ^a   Eisenbraun, Eric ^a   Kaloyeros, Alain E ^a   Nyein, Ei Ei ^b   Hommerich, Uwe ^b  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b HAMPTON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BROADBAND EXCITATION; OXYGEN CONCENTRATIONS; SILICON OXYCARBIDE; THERMAL CHEMICAL VAPOR DEPOSITION;

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); ERBIUM; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SILICON COMPOUNDS; SYNTHESIS (CHEMICAL); THERMOANALYSIS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTOLUMINESCENCE;

EID: 24644493716     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2032600     Document Type: Article

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