-
1
-
-
39549098857
-
A high-stress liner comprising diamond-like carbon (DLC) for strained p-channel MOSFET
-
Feb
-
K.-M. Tan, M. Zhu, W.-W. Fang, M. Yang, T.-Y. Liow, R. T. P. Lee, K. M. Hoe, C.-H. Tung, N. Balasubramanian, G. S. Samudra, and Y.-C. Yeo, "A high-stress liner comprising diamond-like carbon (DLC) for strained p-channel MOSFET," IEEE Electron Device Lett., vol. 29, no. 2, pp. 192-194, Feb. 2008.
-
(2008)
IEEE Electron Device Lett
, vol.29
, Issue.2
, pp. 192-194
-
-
Tan, K.-M.1
Zhu, M.2
Fang, W.-W.3
Yang, M.4
Liow, T.-Y.5
Lee, R.T.P.6
Hoe, K.M.7
Tung, C.-H.8
Balasubramanian, N.9
Samudra, G.S.10
Yeo, Y.-C.11
-
2
-
-
47249103907
-
Diamond-like carbon (DLC) liner: A new stressor for p-channel multiple-gate field-effect transistors
-
Jul
-
K.-M. Tan, W.-W. Fang, M. Yang, T.-Y. Liow, R. T. P. Lee, N. Balasubramanian, and Y.-C. Yeo, "Diamond-like carbon (DLC) liner: A new stressor for p-channel multiple-gate field-effect transistors," IEEE Electron Device Lett., vol. 29, no. 7, pp. 750-752, Jul. 2008.
-
(2008)
IEEE Electron Device Lett
, vol.29
, Issue.7
, pp. 750-752
-
-
Tan, K.-M.1
Fang, W.-W.2
Yang, M.3
Liow, T.-Y.4
Lee, R.T.P.5
Balasubramanian, N.6
Yeo, Y.-C.7
-
3
-
-
47249096503
-
A new liner stressor with very high intrinsic stress (> 6 GPa) and low permittivity comprising diamond-like carbon (DLC) for strained p-channel transistors
-
K.-M. Tan, M. Zhu, W.-W. Fang, M. Yang, T.-Y. Liow, R. T. P. Lee, K. M. Hoe, C.-H. Tung, N. Balasubramanian, G. S. Samudra, and Y.-C. Yeo, "A new liner stressor with very high intrinsic stress (> 6 GPa) and low permittivity comprising diamond-like carbon (DLC) for strained p-channel transistors," in IEDM Tech. Dig., 2007, pp. 127-130.
-
(2007)
IEDM Tech. Dig
, pp. 127-130
-
-
Tan, K.-M.1
Zhu, M.2
Fang, W.-W.3
Yang, M.4
Liow, T.-Y.5
Lee, R.T.P.6
Hoe, K.M.7
Tung, C.-H.8
Balasubramanian, N.9
Samudra, G.S.10
Yeo, Y.-C.11
-
4
-
-
62549127718
-
Performance benefits of diamond-like carbon liner stressor in strained p-channel field-effect transistors with silicon-germanium source and drain
-
Mar
-
K.-M. Tan, M. Yang, W.-W. Fang, A. E. J. Lim, R. T. P. Lee, T.-Y. Liow, and Y.-C. Yeo, "Performance benefits of diamond-like carbon liner stressor in strained p-channel field-effect transistors with silicon-germanium source and drain," IEEE Electron Device Lett., vol. 30, no. 3, pp. 250-253, Mar. 2009.
-
(2009)
IEEE Electron Device Lett
, vol.30
, Issue.3
, pp. 250-253
-
-
Tan, K.-M.1
Yang, M.2
Fang, W.-W.3
Lim, A.E.J.4
Lee, R.T.P.5
Liow, T.-Y.6
Yeo, Y.-C.7
-
5
-
-
67349234932
-
Ultra high-stress liner comprising diamond-like carbon for performance enhancement of p-channel multiple-gate transistors
-
Jun
-
K.-M. Tan, M. Yang, T.-Y. Liow, R. T.-P. Lee, and Y.-C. Yeo, "Ultra high-stress liner comprising diamond-like carbon for performance enhancement of p-channel multiple-gate transistors," IEEE Trans. Electron Devices, vol. 56, no. 6, pp. 1277-1283, Jun. 2009.
-
(2009)
IEEE Trans. Electron Devices
, vol.56
, Issue.6
, pp. 1277-1283
-
-
Tan, K.-M.1
Yang, M.2
Liow, T.-Y.3
Lee, R.T.-P.4
Yeo, Y.-C.5
-
6
-
-
39549108423
-
Stress dependence and poly-pitch scaling characteristics of (110) PMOS drive current
-
B. F. Yang, K. Nummy, A. Waite, L. Black, H. Gossmann, H. Yin, Y. Liu, B. Kim, S. Narasimha, P. Fisher, H. V.Meer, J. Johnson, D. Chidambarrao, S. D. Kim, C. Sheraw, D. Wehella-Gamage, J. Holt, X. Chen, D. Park, C. Y. Sung, D. Schepis, M. Khare, S. Luning, and P. Agnello, "Stress dependence and poly-pitch scaling characteristics of (110) PMOS drive current," in Proc. IEEE Symp. VLSI Technol., 2007, pp. 126-127.
-
(2007)
Proc. IEEE Symp. VLSI Technol
, pp. 126-127
-
-
Yang, B.F.1
Nummy, K.2
Waite, A.3
Black, L.4
Gossmann, H.5
Yin, H.6
Liu, Y.7
Kim, B.8
Narasimha, S.9
Fisher, P.10
Meer, H.V.11
Johnson, J.12
Chidambarrao, D.13
Kim, S.D.14
Sheraw, C.15
Wehella-Gamage, D.16
Holt, J.17
Chen, X.18
Park, D.19
Sung, C.Y.20
Schepis, D.21
Khare, M.22
Luning, S.23
Agnello, P.24
more..
-
7
-
-
33645462580
-
g characteristics
-
Jan
-
g characteristics," IEEE Electron Device Lett., vol. 27, no. 1, pp. 55-57, Jan. 2006.
-
(2006)
IEEE Electron Device Lett
, vol.27
, Issue.1
, pp. 55-57
-
-
Shen, C.1
Li, M.F.2
Wang, X.P.3
Yeo, Y.-C.4
Kwong, D.L.5
-
8
-
-
51949094289
-
Electron trapping: An unexpected mechanism of NBTI and its implications
-
J. P. Campbell, K. P. Cheung, J. S. Suehle, and A. Oates, "Electron trapping: An unexpected mechanism of NBTI and its implications," in Proc. Symp. VLSI Technol., 2008, pp. 76-77.
-
(2008)
Proc. Symp. VLSI Technol
, pp. 76-77
-
-
Campbell, J.P.1
Cheung, K.P.2
Suehle, J.S.3
Oates, A.4
-
9
-
-
33847683297
-
-
G. Thareja, F. Z. J. Lee, A. V. Y. Thean, V. Vartanian, and B. Y. Nguyen, NBTI reliability of strained SOI MOSFETs, in Proc. ISTFA 2006, pp. 423-425.
-
G. Thareja, F. Z. J. Lee, A. V. Y. Thean, V. Vartanian, and B. Y. Nguyen, "NBTI reliability of strained SOI MOSFETs," in Proc. ISTFA 2006, pp. 423-425.
-
-
-
-
10
-
-
33847721005
-
Negative bias temperature instability of carrier-transport enhanced pMOSFET with performance boosters
-
H. S. Rhee, H. Lee, T. Ueno, D. S. Shin, S. H. Lee, Y. Kim, A. Samoilov, P. O. Hansson, M. Kim, H. S. Kim, and N.-I. Lee, "Negative bias temperature instability of carrier-transport enhanced pMOSFET with performance boosters," in IEDM Tech. Dig., 2005, pp. 692-695.
-
(2005)
IEDM Tech. Dig
, pp. 692-695
-
-
Rhee, H.S.1
Lee, H.2
Ueno, T.3
Shin, D.S.4
Lee, S.H.5
Kim, Y.6
Samoilov, A.7
Hansson, P.O.8
Kim, M.9
Kim, H.S.10
Lee, N.-I.11
-
11
-
-
40549128727
-
Understand NBTI mechanism by developing novel measurement techniques
-
Mar
-
M.-F. Li, D. Huang, S. Chen, T. Yang, W. J. Liu, and Z. Liu, "Understand NBTI mechanism by developing novel measurement techniques," IEEE Trans. Device Mater. Rel., vol. 8, no. 1, pp. 62-71, Mar. 2008.
-
(2008)
IEEE Trans. Device Mater. Rel
, vol.8
, Issue.1
, pp. 62-71
-
-
Li, M.-F.1
Huang, D.2
Chen, S.3
Yang, T.4
Liu, W.J.5
Liu, Z.6
-
12
-
-
46049113552
-
Characterization and physical origin of fast Vth transient in NBTI of pMOSFETs with SiON dielectric
-
C. Shen, M. F. Li, C. E. Foo, T. Yang, D. M. Huang, A. Yap, G. S. Samudra, and Y. C. Yeo, "Characterization and physical origin of fast Vth transient in NBTI of pMOSFETs with SiON dielectric," in IEDM Tech. Dig., 2006, pp. 1-4.
-
(2006)
IEDM Tech. Dig
, pp. 1-4
-
-
Shen, C.1
Li, M.F.2
Foo, C.E.3
Yang, T.4
Huang, D.M.5
Yap, A.6
Samudra, G.S.7
Yeo, Y.C.8
-
13
-
-
46649105814
-
A study of SRAM NBTI by OTF measurement
-
H. Aono, E. Murakami, K. Shiga, F. Fujita, S. Yamamoto, M. Ogasawara, Y. Yamaguchi, K. Yanagisawa, and K. Kubota, "A study of SRAM NBTI by OTF measurement," in Proc. IEEE Int. Reliab. Phys. Symp., 2008, pp. 67-71.
-
(2008)
Proc. IEEE Int. Reliab. Phys. Symp
, pp. 67-71
-
-
Aono, H.1
Murakami, E.2
Shiga, K.3
Fujita, F.4
Yamamoto, S.5
Ogasawara, M.6
Yamaguchi, Y.7
Yanagisawa, K.8
Kubota, K.9
-
14
-
-
34250737319
-
Interface-trap driven NBTI for ultrathin (EOT ∼ 12Å) plasma and thermal nitrided oxynitrides
-
G. Gupta, S. Mahapatra, L. Leela Madhav, D. Varghese, K. Ahmed, and F. Nouri, "Interface-trap driven NBTI for ultrathin (EOT ∼ 12Å) plasma and thermal nitrided oxynitrides," in Proc. IEEE Int. Reliab. Phys. Symp., 2006, pp. 731-732.
-
(2006)
Proc. IEEE Int. Reliab. Phys. Symp
, pp. 731-732
-
-
Gupta, G.1
Mahapatra, S.2
Leela Madhav, L.3
Varghese, D.4
Ahmed, K.5
Nouri, F.6
-
15
-
-
68249153997
-
NBTI effects of pMOSFETs with different nitrogen dose implantation
-
Y. J. Lee, Y. C. Tang, M. H. Wu, T. S. Chao, P. T. Ho, D. Lai, W. L. Yang, and T. Y. Huang, "NBTI effects of pMOSFETs with different nitrogen dose implantation," in Proc. IEEE Int. Reliab. Phys. Symp. 2004, pp. 681-682.
-
(2004)
Proc. IEEE Int. Reliab. Phys. Symp
, pp. 681-682
-
-
Lee, Y.J.1
Tang, Y.C.2
Wu, M.H.3
Chao, T.S.4
Ho, P.T.5
Lai, D.6
Yang, W.L.7
Huang, T.Y.8
-
16
-
-
68249139035
-
-
S. Rangan, N. Mielke, and E. C. C. Yeh, Universal recovery behavior of negative bias temperature instability [PMOSFETs], in IEDM Tech. Dig., 2003, pp. 14.3.1-14.3.4.
-
S. Rangan, N. Mielke, and E. C. C. Yeh, "Universal recovery behavior of negative bias temperature instability [PMOSFETs]," in IEDM Tech. Dig., 2003, pp. 14.3.1-14.3.4.
-
-
-
-
17
-
-
4143060374
-
Effect of channel width, length, and latent damage on NBTI
-
G. Cellere, M. G. Valentini, and A. Paccagnella, "Effect of channel width, length, and latent damage on NBTI," in Proc. ICICDT, 2004, pp. 303-306.
-
(2004)
Proc. ICICDT
, pp. 303-306
-
-
Cellere, G.1
Valentini, M.G.2
Paccagnella, A.3
-
18
-
-
84955259235
-
Negative bias temperature instability of pMOSFETs with ultra-thin SiON gate dielectrics
-
S. Tsujikawa, T. Mine, K. Watanabe, Y. Shimamoto, R. Tsuchiya, K. Ohnishi, T. Onai, J. Yugami, and S. Kimura, "Negative bias temperature instability of pMOSFETs with ultra-thin SiON gate dielectrics," in Proc. IEEE Int. Reliab. Phys. Symp., 2003, pp. 183-188.
-
(2003)
Proc. IEEE Int. Reliab. Phys. Symp
, pp. 183-188
-
-
Tsujikawa, S.1
Mine, T.2
Watanabe, K.3
Shimamoto, Y.4
Tsuchiya, R.5
Ohnishi, K.6
Onai, T.7
Yugami, J.8
Kimura, S.9
-
19
-
-
20344396092
-
Modeling of NBTI saturation effect and its impact on electric field dependence of the lifetime
-
Jul./Aug
-
H. Aono, E. Murakami, K. Okuyama, A. Nishida, M. Minami, Y. Ooji, and K. Kubota, "Modeling of NBTI saturation effect and its impact on electric field dependence of the lifetime," Microelectron. Reliab., vol. 45, no. 7/8, pp. 1109-1114, Jul./Aug. 2005.
-
(2005)
Microelectron. Reliab
, vol.45
, Issue.7-8
, pp. 1109-1114
-
-
Aono, H.1
Murakami, E.2
Okuyama, K.3
Nishida, A.4
Minami, M.5
Ooji, Y.6
Kubota, K.7
|