Interface-trap driven NBTI for ultrathin (EOT∼12Å) plasma and thermal nitrided oxynitrides

IEEE International Reliability Physics Symposium Proceedings

Volumn , Issue , 2006, Pages 731-732

  Gupta, G ^a   Mahapatra, S ^a   Leela Madhav, L ^a   Varghese, D ^a   Ahmed, K ^b   Nouri, F ^b  

^a INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

^b APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACE TRAP; NBTI; NITRIDED OXYNITRIDES; SI OXYNITRIDE (SION);

NITRIDES; PLASMA APPLICATIONS; SILICON; THERMAL EFFECTS; THRESHOLD VOLTAGE;

ULTRATHIN FILMS;

EID: 34250737319     PISSN: 15417026     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/RELPHY.2006.251347     Document Type: Conference Paper

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