Recent situation of industrial implementation of Cat-CVD technology in Japan

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 537-540

  Matsumura, Hideki ^a   Ohdaira, Keisuke ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Cat CVD; Cat CVD apparatus; Device application; Hot wire CVD; Industrialization

Indexed keywords

BIOTECHNOLOGY; CHEMICAL VAPOR DEPOSITION; INDUSTRIAL APPLICATIONS;

CAT-CVD APPARATUS; DEVICE APPLICATIONS; HOT-WIRE CVD; MODERN INDUSTRIES;

SEMICONDUCTOR DEVICES;

EID: 36749103152     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.190     Document Type: Article

References (30)

1. Weisemann H., Ghosh A.K., MacMahon T., and Strongin M. J. Appl. Phys. 50 (1979) 3752
2. Matsumura H. Jpn. J. Appl. Phys. 25 (1986) L949
3. Matsumura H. Jpn. J. Appl. Phys. 30 (1991) L1522
4. Itoh T., Katoh Y., Fujiwara T., Furunaga K., Nonomura S., and Nitta S. Thin Solid Films 395 (2001) 240
5. Miyajima S., Yamada A., and Konagai M. Thin Solid Films 430 (2003) 274
6. Matsumura H. Appl. Phys. Lett. 51 (1987) 804
7. Matsumura H. J. Appl. Phys. 66 (1989) 3612
8. Okada S., and Matsumura H. Jpn. J. Appl. Phys. 36 (1997) 7035
9. Izumi A., and Oda K. Thin Solid Films 501 (2006) 195
10. Yasui K., Nishiyama H., Inoue Y., and Akahane M. Abstract of 3rd Cat-CVD Research Meeting, 23-24 June, 2006, Nagaoka (2006) 97 (in Japanese)
11. Saitoh K., Ushiyama Y., and Abe K. Thin Solid Films 430 (2003) 287
12. Matsumoto Y. Thin Solid Films 501 (2006) 95
13. Ogita Y., Iehara S., and Tomita T. Thin Solid Films 430 (2003) 161
14. Dupuie J.L., and Gulari E. J. Vac. Sci. Technol., A, Vac. Surf. Films 10 (1992) 18
15. Lau K.K.S., Caulfield J.A., and Gleason K.K. Chem. Mater. 12 (2000) 3032
16. Ohdaira K., Yasuoka H., Yoshida M., Sugita K., Murata H., and Matsumura H. Abstract of 3rd Cat-CVD Research Meeting, 23-24 June, 2006, Nagaoka (2006) 109 (in Japanese). And also, Ext. Abstract of this Conference
17. Lau K.K.S., Mao Y., Pryce H.G., Murthy S.K., Olsen B.D., Loo L.S., and Gleason K. Thin Solid Films 501 (2006) 211
18. Matsumura H., Masuda A., and Umemoto H. Thin Solid Films 501 (2006) 58
19. Okada S., and Matsumura H. Jpn. J. Appl. Phys. 36 (1887) 7035
20. Akasaka Y. Ext. Abstract of this 4th Int. Conf. on HWCVD (Cat-CVD) Process, FrB02, Takayama, Oct. (2006)
21. Osono S., Kitazoe M., Tsuboi H., Asari S., and Saito K. Thin Solid Films 501 (2006) 61
22. Terakawa A., Asaumi T., Kobayashi S., Tsunomura Y., Yagiura T., Taguchi M., Yoshimine Y., Sakata H., Maruyama E., and Tanaka M. Proc. of 15th Int. Photovoltaic Sci. and Eng. (PVSEC-15), Shanghai, China (2005) 661
23. Matsumura H., Kikkawa A., Tsutsumi T., Masuda A., Izumi A., Takahashi M., Ohtsuka H., and Moschner J.D. Proc. of 3rd World Conf. on Photovoltaic Energy Conversion, Osaka, Japan (2003) 1147
24. Hattori R., Nakamura G., Nomura S., Ichise T., Masuda A., and Matsumura H. Tech. Digest of 19th Annual GaAs IC Symposium, Anaheim, USA (1997) 78
25. Kaminishi D., Ozaki H., Ohno Y., Maehashi K., Inoue K., Matsumoto K., Seri Y., Masuda A., and Matsumura H. Appl. Phys. Lett. 86 (2005) 13115
26. Ogawa Y., Ohdaira K., Oyaidu T., and Matsumura H. Ext. Abstract of this 4th Int. Conf. on HWCVD (Cat-CVD) Process, SaB08, Takayama, Oct. (2006)
27. Hashimoto K., Masuda A., Matsumura H., Ishibashi T., and Takano K. Thin Solid Films 501 (2006) 326
28. Nishiyama I., Oizumi H., Yamanashi H., Hashimoto K., Osono S., Masuda A., Izumi A., and Matsumura H. Ext. Abstract of 1st Cat-CVD Research Meeting, Kanazawa, Japan (2003) 107 (In Japanese)
29. Ishibashi K. Thin Solid Films 395 (2001) 55
30. Honda K., Ohdaira K., and Matsumura H. Ext. Abstract of this 4th Int. Conf. on HWCVD (Cat-CVD) Process, WeD02, Takayama, Oct. (2006)