Spatial concentration and temperature distribution of CH radicals formed in a diamond thin-film hot-filament reactor

Chemical Physics Letters

Volumn 320, Issue 3-4, 2000, Pages 339-344

  Lommatzsch, U ^a   Wahl, E H ^b   Owano, T G ^b   Kruger, C H ^b   Zare, R N ^a  

^a STANFORD UNIVERSITY   (United States)

^b Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001524333     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0009-2614(00)00250-5     Document Type: Article

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