Fluid-photoresist interactions and imaging in high-index immersion lithography

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 3, 2009, Pages

  Tran, Hoang V ^a   Hendrickx, Eric ^b   Van Roey, Frieda ^b   Vandenberghe, Geert ^b   French, Roger H ^a  

^a DUPONT COMPANY   (United States)

^b IMEC   (Belgium)

Author keywords

Defectivity; High index materials; Imaging; Immersion fluids; Leaching; Lithography; Photoresists

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; LEACHING; LEAKAGE (FLUID); OPTICAL SYSTEMS; PHOTORESISTORS; PHOTORESISTS; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; REFRACTIVE INDEX;

DEFECTIVITY; HIGH INDEX FLUID; HIGH INDEX MATERIALS; HIGH-INDEX; HIGH-INDEX IMMERSION FLUID; IMMERSION FLUIDS; IMMERSION LITHOGRAPHY; LINE PATTERN; NUMERICAL APERTURE; OPTICAL IMMERSION; PHOTOACID GENERATORS; POST-EXPOSURE; RESIST PROFILE; RESIST THICKNESS;

FLUIDS;

EID: 67650917653     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3224950     Document Type: Article

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