High-index immersion fluids enabling cost-effective single-exposure lithography for 32 nm half pitches

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  French, Roger H ^a   Tran, Hoang V ^a   Adelman, Doug J ^a   Rogado, Nyrissa S ^a   Kaku, Mureo ^a   Mocella, Michael ^a   Chen, Charles Y ^b   Hendrickx, Eric ^c   Van Roey, Frieda ^c   Bernfeld, Adam S ^a   Derryberry, Rebekah A ^a  

^a DUPONT COMPANY   (United States)

^b DuPont Electronic Technologies   (United States)

^c IMEC   (Belgium)

Author keywords

Absorbance; Active recycle; Fluid handling; Hydrocarbons; Immersion; Particle contamination; Radiation durability; Refractive index; Second generation fluid; Window contamination

Indexed keywords

(1 1 0) SURFACE; FLUID INTERACTIONS; HIGH INDEX; IMMERSION FLUIDS; OPTICAL MICRO LITHOGRAPHY; PACKAGE TECHNOLOGIES; PROCESS MATERIALS; USEFUL LIFE;

COMPUTER NETWORKS; COST EFFECTIVENESS; CURVE FITTING; FLUIDICS; LEAKAGE (FLUID); LITHOGRAPHY; OPTICAL WAVEGUIDES; PIGMENTS; SURFACE DEFECTS; TECHNOLOGY;

FLUIDS;

EID: 45449095694     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772105     Document Type: Conference Paper

References (8)

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2. S. Peng, R. H. French, W. Qiu, R. C. Wheland, M. K. Yang, M. F. Lemon, M. K. Crawford, "Second Generation Fluids for 193 nm Immersion Lithography", Optical Microlithography XVIII, SPIE Vol. ML5754-76, (2005).
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5. S. Peng, R. H. French, W. Qiu, R. C. Wheland, M. K. Yang, M. F. Lemon, M. K. Crawford, "Second Generation Fluids for 193 nm Immersion Lithography", Optical Microlithography XVIII, SPIE Vol. ML5754-76, (2005).
6. R. H. French, W. Qiu, M. K. Yang, R. C. Wheland, M. F. Lemon, A. L. Shoe, D. J. Adelman, M. K. Crawford, H. V. Tran, J. Feldman, S. J. McLain, S. Peng, "Second Generation Fluids for 193nm Immersion Lithography", Optical Microlithography XDC, SPIE Vol. ML6154-42, (2006).
7. Hoang V. Tran, Roger H. French, Douglas J. Adelman, Jerald Feldman, Weiming Qiu, Robert C. Wheland, Luke W. Brubaker, Brian E. Fischel, Barbara B. Fones, Michael F. Lemon, Min K. Yang, Osami Nagao, Mureo Kaku, Michael Mocella, and John J. Schmieg. "Evaluation of Next Generation Fluids for ArF Immersion Lithography Beyond Water", Journal of Photopolymer Science and Technology 20(5), (2007), 729-738.
8. Eric Hendrickx, Sergei Postnikov, Philippe Foubert, Roel Gronheid, ByeongSoo Kim. "Screening of Second Generation High Index Fluids", Advances in Resist Materials and Processing Technology XXIV, SPIE Vol. 6519, 65190A, (2007).