Study of barrier coats for protection against airborne contamination in 157 nm lithography

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 1136-1149

  Houlihan, Francis ^a   Sakamuri, Raj ^a   Hamilton, Keino ^a   Dimerli, Alla ^a   Rentkiewicz, David ^a   Romano, Andrew ^a   Dammel, Ralph R ^a   Wei, Yayi ^b   Stepanenko, Nickolay ^c   Sebald, Michael ^c   Hohle, Christoph ^c   Conley, Will ^d   Miller, Daniel ^d   Itani, Toshiro ^e   Shigematsu, Masato ^e   Kawaguchi, Etsuro ^e  

^a AZ Electronic Materials USA Corp   (United States)

^b INFINEON TECHNOLOGIES   (United States)

^c Infineon   (Germany)

^d SEMATECH   (United States)

^e SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

157 nm lithography; 157 nm photoresist; Amine barrier coat

Indexed keywords

157 NM LITHOGRAPHY; 157 NM PHOTORESISTS; AMINE BARRIER COAT; FILM COATING;

ALCOHOLS; AMINES; CONTAMINATION; COPOLYMERS; ORGANIC SOLVENTS; PROTECTIVE COATINGS;

COATING TECHNIQUES;

EID: 24644523294     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601810     Document Type: Conference Paper

References (8)

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2. Shun-ichi Kodama, Isamu Kaneko, Yoko Takebe, Shinji, Okada, Yasuhide, Kawaguchi, Naomi Schida, Seiichi Ishikawa, Minoru Toriumi, Toshiro Itani, Advances in Resist Technology and Processing XIX, Proceedings of SPIE Vol 4690 p76 (2002).
3. Francis Houlihan, Raj Sakamuri, Andrew Romano, Ralph R. Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joe McDaniels, Chun Chang, Advances in Resist Technology and Processing XX, Proceedings of SPIE 5039, 22 (2003);
4. Francis Houlihan, Raj Sakamuri, Andrew Romano, Ralph R. Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joe McDaniels, Chun Chang, Journal of Photopolymer Science and Technology, Volume 16(4), 581 (2003).
5. Francis Houlihan, Raj Sakamuri, Andrew Romano, Ralph R. Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joe McDaniels, ChunChang Advances in Resist Technology and Processing XX, Proceedings of SPIE 5039, 641(2003).
6. Francis Houlihan*a, Raj Sakamuria, Andrew Romanoa, David Rentkiewicz, Ralph R. Dammel, Will Conley, Daniel Miller, Michael Sebald, Nickolay Stepanenko, M. Markert, U. Mierau, Inge. Vermeir, Christoph Hohle, Toshiro Itani, Masato Shigematsu, Etsuro Kawaguchi, Advances in Resist Technology and Processing XXI, Proceedings of SPIE 5376, 134(2004)
7. Francis Houlihan*, Raj Sakamuri, Andrew Romano, David Rentkiewicz, Ralph R. Dammel, Will Conley, Daniel Miller, Michael Sebald, Nickolay Stepanenko, M. Markert, U. Mierau, Inge.Vermeir, Christoph Hohle, Toshiro Itani, Masato Shigematsu, Etsuro Kawaguchi Journal of Photopolymer Science and Technology, Volume 12(4), 621 (2004).
8. "Study of 157 nm Resists with Full Field Exposure Tools," Yayi Wei, Nickolay Stepanenko, Michael Sebald, Christoph Hohle, Frank Houlihan, Raj Sakamuri, Alla Dimerli, Andrew Romano, Ralph R. Dammel, Advances in Resist Technology and Processing XXII, Proceedings of SPIE in press (2005)