Index of refraction of high-index lithographic immersion fluids and its variability

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 2, 2009, Pages

  Yang, Min K ^a   Kaplan, Simon G ^b   French, Roger H ^a   Burnett, John H ^b  

^a DUPONT COMPANY   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Index; Lithography; Temperature coefficient of the refractive index

Indexed keywords

DISPERSION (WAVES); LIGHT REFRACTION; OPTICAL WAVEGUIDES; REFRACTION; REFRACTIVE INDEX; REFRACTOMETERS;

ABSORBANCES; AIR EXPOSURE; HIGH-INDEX; HILGER-CHANCE; IMAGE PRINTING; IMMERSION FLUIDS; IMMERSION LITHOGRAPHY; IMMERSION SYSTEMS; INDEX; INDEX OF REFRACTION; KEY PARAMETERS; LASER WAVELENGTH; MINIMUM DEVIATION METHODS; SPECTRAL INDICES; TEMPERATURE COEFFICIENT; TEMPERATURE COEFFICIENT OF THE REFRACTIVE INDEX; THERMO-OPTIC COEFFICIENTS;

FLUIDS;

EID: 80055033468     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3124189     Document Type: Article

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