Experimental techniques for detection of components extracted from model 193 nm immersion lithography photoresists

Chemistry of Materials

Volumn 17, Issue 16, 2005, Pages 4194-4203

  Taylor, J Christopher ^a   LeSuer, Robert J ^a,c   Chambers, Charles R ^a   Fan, Fu Ren F ^a   Bard, Allen J ^a   Conley, Willard E ^a,b   Willson, C Grant ^a  

^a The University of Texas at Austin   (United States)

^b SEMATECH   (United States)

^c CHICAGO STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LIQUID SCINTILLATION COUNTING (LSC); PHOTOACID GENERATORS (PAG); RESIDUAL CASTING SOLVENT (RSC); SCANNING ELECTROCHEMICAL MICROSCOPY (SECM);

LEACHING; LIQUID CHROMATOGRAPHY; MASS SPECTROMETRY; ORGANIC SOLVENTS; PHOTORESISTORS; SCANNING ELECTRON MICROSCOPY; SCINTILLATION;

LITHOGRAPHY;

EID: 23844465962     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm050294t     Document Type: Article

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