Immersion fluid refractive indices using prism minimum deviation techniques

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 3, 2004, Pages 1689-1694

  French, Roger H ^a   Yang, Min K ^a   Lemon, M F ^a   Synowicki, R A ^b   Pribil, Greg K ^b   Cooney, Gerald T ^b   Herzinger, Craig M ^b   Green, Steven E ^b   Burnett, John H ^c   Kaplan, Simon ^c  

^a DUPONT COMPANY   (United States)

^b J A WOOLLAM CO INC   (United States)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

157 nm Lithography; 193 nm Lithography; Immersion Fluid; Immersion Lithography; Index of Refraction

Indexed keywords

157 NM LITHOGRAPHY; 193 NM LITHOGRAPHY; IMMERSION FLUID; IMMERSION LITHOGRAPHY; INDEX OF REFRACTION;

ELLIPSOMETRY; FUSED SILICA; LIGHT REFRACTION; PRISMS; REFRACTIVE INDEX; SPECTROSCOPIC ANALYSIS;

LITHOGRAPHY;

EID: 3843124142     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537727     Document Type: Conference Paper

References (6)

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6. th, 2004, Los Angeles CA.