Early learning on hyper-NA lithography using two-beam immersion interference

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 II, Issue , 2006, Pages

  Hendrickx, Eric ^a   De Beeck, Maaike Op ^a   Gronheid, Roel ^a   Versluijs, Janko ^a   Van Look, Lieve ^a   Ercken, Monique ^a   Vandenberghe, Geert ^a  

^a IMEC   (Belgium)

Author keywords

High index liquids; Hyper na process development; Interferometric imaging; Leaching; Optical lithography; Polarization

Indexed keywords

IMAGING TECHNIQUES; INTERFEROMETRY; LEACHING; LEARNING SYSTEMS; POLARIZATION; REFRACTIVE INDEX; SIGNAL INTERFERENCE;

HIGH-INDEX LIQUIDS; HYPER-NA PROCESS DEVELOPMENT; INTERFEROMETRIC IMAGING; REFLECTION REDUCTION STRATEGIES;

PHOTOLITHOGRAPHY;

EID: 33745774338     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.659007     Document Type: Conference Paper

References (7)

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2. A. Bourov, Y. Fan, F. Cropanese, N. Lafferty, L. Zavyalova, H. Kang, B. W. Smith, Proc SPIE 5377 (2004) p. 1573.
3. th edition, Addison Wesley Longman, Inc. 2002, p. 387 and 570-572.
4. nd International Symposium on Immersion Lithography, Bruges (Belgium), September 12-15, 2005.
5. nd International Symposium on Immersion Lithography, Bruges (Belgium), September 12-15, 2005.
6. R. R. Dammel et al. "Leaching Phenomena and their Suppresion in 193nm Immersion Lithography" Journal of Photopolymer Science and Technology, 18, 593-602 (2005).
7. H. Sewell, D. McCafferty, L. Markoya, E. Hendrickx, J. Hermans, and K. Ronse Proc SPIE 5753 (2005), 491.