Liquid immersion lithography - Evaluation of resist issues

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 21-33

  Hinsberg, William ^a   Wallraff, Gregory ^a   Larson, Carl ^a   Davis, Blake ^a   Deline, Vaughn ^a   Raoux, Simone ^a   Miller, Dolores ^a   Houle, Frances ^a   Hoffnagle, John ^a   Sanchez, Martha ^a   Rettner, Charles ^a   Sundberg, Linda ^a   Medeiros, David ^b   Dammel, Ralph ^c   Conley, Will ^d  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c CLARIANT CORPORATION   (United States)

^d MOTOROLA INC   (United States)

Author keywords

Chemically amplified resists; Contamination; Immersion; Resolution

Indexed keywords

CHEMICALLY AMPLIFIED RESISTS; IMMERSION; LIQUID IMMERSION LITHOGRAPHY (LIL); SPATIAL RESOLUTION;

DIFFUSION; IMAGING TECHNIQUES; INTERFEROMETERS; OPTICAL MICROSCOPY; OPTICAL RESOLVING POWER; PHOTORESISTORS; REACTION KINETICS; ULTRAVIOLET RADIATION;

LITHOGRAPHY;

EID: 3843078452     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536576     Document Type: Conference Paper

References (30)

1. R. Smith, "Microscopy and Photomicrography : a working manual," CRC Press, Boca Raton, FL,1990.
2. C. Shank and R. Schmidt, Appl. Phys. Lett, 23, 154 (1973).
3. B. Lin, Microelectron. Eng, 6, 31 (1987).
4. H. Kawata, J. Carter, A. Yen and H. Smith, Microelectron. Eng, 9, 31 (1989).
5. J. Hoffnagle, W. Hinsberg, M. Sanchez and F. Houle, J. Vac. Sci Techn. B, 17, 3306 (1999).
6. M. Switkes and M. Rothschild, J. Vac. Sci. Techn. B, 19, 2353 (2001).
7. A. Raub and S. Brueck, Proc. Soc. Photo-Opt. Instr. Eng., 5040, 667 (2003).
8. B. Smith, H. Kang, A. Bourov, F. Copranese and Y. Fan, Proc. Soc. Photo-Opt. Instr. Eng., 4690, 679 (2002).
9. SEMATECH Immersion Lithography Workshop, Burlingame, CA, Dec 11 2002.
10. W. Conley, this proceedings, paper 5376-02.
11. W. Hinsberg, F. Houle, M. Sanchez, J. Hoffnagle, G. Walkaff, D. Medeiros, J. Cobb and G. Gallatin, Proc. Soc. Photo-Opt. Instr. Eng., 5039, l (2003).
12. S. Burns, D. Medeiros, H. Johnson, G. Walraff, W. Hinsberg and G. Willson, Proc. Soc. Photo-Opt. Instr. Eng., 4690, 313 (2002).
13. J. Guillet, "Polymer Photophysics and Photochemistry," Cambridge University Press, New York, 1985.
14. J. Hoffnagle, W. Hinsberg, M. Sanchez and F. Houle, Optic Lett., 27, 1776 (2002).
15. W. Conley, G. Breyta, W. Brunsvold, R. Di Pietro, D. Hofer, S. Holmes, H. Ito, R. Nunes, G. Fichtl, P. Hagerty, and J. Thackeray, Proc. Soc. Photo-Opt. Instr. Eng, 2724, 34 (1996).
16. G. Wallraff, J. Hutchinson, W. Hinsberg, F. Houle, P. Seidel, R. Johnson, W. Oldham, J. Vac. Sci. Techn. B, 12, 3857 (1994).
17. F. Houle, W. Hinsberg, M. Morrison, M. Sanchez, G. Wallraff, C. Larson, J. Hoffnagle, J. Vac. Sci. Techn. B 18, 1874 (2000).
18. U. Kumar, A. Pandya, R. Sinta, W. Huang, R. Bantu and A. Katnani, Proc. Soc. Photo-Opt. Instr. Eng, 3049, 135 (1997).
19. R. Kwon, W. Huang, W. Moreau, R. Lang, C. Robinson, D. Medeiros, A. Aviram, R. Guarneri and M. Angelopolous, Mater. Res. Soc. Symp Proc, 584, 147 (2000).
20. G. Wallraff, W. Hinsberg, F. Houle, M. Morrison, C. Larson, M. Sanchez, J. Hoffnagle, P. Brock and G. Breyta, Proc. Soc. Photo-Opt. Instr. Eng, 3678, 138 (1999).
21. R. Allen, G. Wallraff, R. DiPietro, D. Hofer and R. Kunz, Proc. Soc. Photo-Opt. Instr. Eng, 2438, 474 (1995).
22. J. Stöhr, "NEXAFS Spectroscopy," Springer Series in Surface Sciences, Vol. 25, Springer, New York, 1992.
23. W. Hinsberg, F. Houle, H. Ito, K. Kanzawa and Seok-Won Lee, Proc. 13th Intl. Conf. on Photopolymers, Soc. of Plastics Eng., Tamiment, PA (2003).
24. J. Crank, "The Mathematics of Diffusion", Oxford University Press, New York 1956(paperback edition 1999, ISBN 0 19 853411 6), p. 53ff.
25. A.C. Jason and G.R. Peters, J. Phys. D6, 512 (1973).
26. F. Sebillote, A. Weill, P. Paniez, Makromol. Chem. 186, 1695 (1985).
27. Y. Shibayama, M. Saito, Japan. J. Appl. Phys. 29 (10), 2152 (1990).
28. O. Lehar, M. Spak, S. Meyer, R. Dammel, C. Brodsky, and G. Willson, Proc. Soc. Photo-Opt. Instr. Eng, 4345, 463 (2001).
29. S. Hanton, Chem. Rev., 101, 527 (2001).
30. T. Brunner, N. Seong, W. Hinsberg, J. Hoffnagle, F. Houle and M. Sanchez, J. Microlith., Microfab., Microsyst., 1, 188 (2002).