High refractive index fluid evaluations at 193 nm: Fluid lifetime and fluid/resist interaction studies

Journal of Photopolymer Science and Technology

Volumn 21, Issue 5, 2008, Pages 631-639

  Tran, Hoang V ^a   Hendrickx, Eric ^b   French, Roger H ^a   Adelman, Douglas J ^a   Rogado, Nyrissa S ^a   Kaku, Mureo ^a   Mocella, Michael ^a   Schmieg, John J ^a   Chen, Charles Y ^c   Van Roey, Frieda ^b   Bernfeld, Adam S ^a   Derryberry A, Rebekah A ^a  

^a DUPONT COMPANY   (United States)

^b IMEC   (Belgium)

^c DuPont Electronic Technologies   (United States)

Author keywords

Absorbance; Active recycle; Defectivity; Immersion lithography; Leaching; Radiation durability; Refractive index; Resist fluid interactions; Second generation fluid; Window contamination

Indexed keywords

EID: 51249092397     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.21.631     Document Type: Article

References (10)

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