Synthesis of diamond using in-liquid plasma chemical vapor deposition

Japanese Journal of Applied Physics

Volumn 48, Issue 3, 2009, Pages 031601-

  Takahashi, Yoshiyuki ^a   Toyota, Hiromichi ^a   Nomura, Shinfuku ^a   Mukasa, Shinobu ^a   Inoue, Toru ^a   Okuda, Shinya ^a,b  

^a EHIME UNIVERSITY   (Japan)

^b TOYOTA INDUSTRIES CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COOLING EFFECTS; COOLING EQUIPMENT; EXPERIMENTAL PARAMETERS; LIQUID PLASMAS; METHANOL SOLUTION; MICROWAVE CVD; MICROWAVE RADIATIONS; SEM; SI SUBSTRATES; SYSTEM PRESSURE;

ATOMIC LAYER DEPOSITION; BODY FLUIDS; CHEMICAL ANALYSIS; CHEMICAL REACTIONS; COOLING; DEPOSITS; DIAMOND FILMS; DIAMONDS; EMISSION SPECTROSCOPY; FILM GROWTH; HARD COATINGS; LIQUIDS; METHANOL; MICROWAVES; OPTICAL EMISSION SPECTROSCOPY; PLASMA DEPOSITION; PLASMAS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; VAPORS;

CHEMICAL VAPOR DEPOSITION;

EID: 67650844738     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.48.031601     Document Type: Article

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