Deposition of diamond film on silicon and quartz substrates located near DC plasma

Diamond and Related Materials

Volumn 14, Issue 11-12, 2005, Pages 1757-1760

  Noda, M ^a   Marui, A ^a   Suzuki, T ^a   Umeno, M ^a  

^a CHUBU UNIVERSITY   (Japan)

Author keywords

DC plasma CVD; Diamond film; Microstructure; Si and quartz substrate

Indexed keywords

MICROSTRUCTURE; QUARTZ; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES;

DC PLASMA CVD; QUARTZ SUBSTRATES;

DIAMOND FILMS;

EID: 27744516183     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.08.050     Document Type: Conference Paper

References (12)

1. K. Suzuki, A. Sawabe, H. Yasuda, and T. Inuzuka Appl. Phys. Lett. 50 1987 728
2. K. Suzuki, A. Sawabe, and T. Inuzuka Jpn. J. Appl. Phys. 29 1990 153
3. S. Nakao, S. Maruno, M. Noda, H. Kusakabe, and H. Shimizu J. Cryst. Growth 99 1990 1215
4. S. Nakao, M. Noda, H. Kusakabe, H. Shimizu, and S. Maruno Jpn. J. Appl. Phys. 29 1990 1511
5. S. Nakao, H. Watatani, S. Maruno, and M. Noda J. Cryst. Growth 115 1991 313
6. S. Nakao, M. Noda, H. Watatani, and S. Maruno Jpn. J. Appl. Phys. 30 1991 L1195
7. S. Nakao, M. Noda, H. Watatani, and S. Maruno Jpn. J. Appl. Phys. 30 1991 L45
8. M. Noda, H. Kusakabe, and K. Taniguchi Jpn. J. Appl. Phys. 33 1994 4400
9. M. Noda Oyo Buturi 65 1996 (in Japanese)
10. T. Araki, M. Noda, and T. Katsuyama Mater. Sci. Eng., B, Solid-State Mater. Adv. Technol. 48 1997 221
11. M. Noda Jpn. J. Appl. Phys. 38 1999 4496
12. M. Noda, and H. Shimizu New Diam. Front. Carbon Technol. 12 2002 133