Application of optical emission spectra in controlling dominant crystalline surface of diamond films deposited by DC arc plasma jet CVD

Surface and Coatings Technology

Volumn 201, Issue 9-11 SPEC. ISS., 2007, Pages 4987-4990

  Zhou, Z Y ^a   Chen, G C ^a   Li, B ^a   Askari, S J ^a   Tang, W Z ^a   Li, C M ^a   Song, J H ^a   Tong, Y M ^a   Lu, F X ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

Author keywords

CVD; DC arc plasma; Diamond films; Gas phase; Orientation

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; FILM GROWTH; SURFACE STRUCTURE; X RAY DIFFRACTION ANALYSIS;

ARC PLASMA JET; OPTICAL EMISSION SPECTROSCOPY;

DIAMOND FILMS;

CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; DIAMOND FILMS; FILM GROWTH; SURFACE STRUCTURE; X RAY DIFFRACTION ANALYSIS;

EID: 33846488362     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.07.214     Document Type: Article

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