Regulation of film thickness, surface roughness and porosity in thin film growth using deposition rate

Chemical Engineering Science

Volumn 64, Issue 17, 2009, Pages 3903-3913

  Hu, Gangshi ^a   Orkoulas, Gerassimos ^a   Christofides, Panagiotis D ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Model predictive control; Process control; Process optimization; Process simulation; Stochastic PDEs; Thin film growth

Indexed keywords

DEPOSITION PROCESS; DISTRIBUTED CONTROL; DISTRIBUTED PARAMETER; FILM POROSITY; KINETIC MONTE CARLO SIMULATION; MIGRATION PROCESS; MODEL PREDICTIVE CONTROL ALGORITHM; MODELING AND CONTROL; POROUS THIN FILMS; PROCESS OPTIMIZATION; PROCESS SIMULATION; SET-POINT; SIMULATION RESULT; SITE OCCUPANCY; STOCHASTIC PDES; SURFACE HEIGHT; TRIANGULAR LATTICE; WORK FOCUS;

ADSORPTION; AIRCRAFT ENGINES; DEPOSITION; DEPOSITION RATES; DYNAMIC MODELS; FILM THICKNESS; LAWS AND LEGISLATION; MAGNETIC FILMS; METAL ANALYSIS; MODEL PREDICTIVE CONTROL; MOLECULAR BEAM EPITAXY; MONTE CARLO METHODS; ORDINARY DIFFERENTIAL EQUATIONS; PARTIAL DIFFERENTIAL EQUATIONS; POROSITY; PREDICTIVE CONTROL SYSTEMS; QUALITY CONTROL; SIMULATORS; STOCHASTIC MODELS; SURFACE PROPERTIES; SURFACE ROUGHNESS; THIN FILM DEVICES; THIN FILMS;

FILM GROWTH;

EID: 67650744233     PISSN: 00092509     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ces.2009.05.034     Document Type: Article

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