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Volumn 311, Issue 14, 2009, Pages 3573-3576
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Misoriented domain formation in 6H-SiC single crystal
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Author keywords
A1. Computer simulation; A1. Defects; A2. Single crystal growth; B2. Semiconducting materials
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Indexed keywords
A1. COMPUTER SIMULATION;
A1. DEFECTS;
A2. SINGLE CRYSTAL GROWTH;
AS-GROWN CRYSTAL;
ATOMIC STRUCTURE;
AXIAL GRADIENT;
B2. SEMICONDUCTING MATERIALS;
CRYSTAL PLANES;
DOMAIN FORMATION;
FORMATION MECHANISM;
GROWTH FRONT;
PHYSICAL VAPOR TRANSPORT;
POLYTYPE;
RAMAN SPECTRA;
THERMAL INSULATORS;
COMPUTER SIMULATION;
CRYSTAL ATOMIC STRUCTURE;
CRYSTAL GROWTH;
CRYSTALLIZATION;
GRAIN BOUNDARIES;
SEMICONDUCTOR GROWTH;
SILICON CARBIDE;
SINGLE CRYSTALS;
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EID: 67649861300
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2009.05.013 Document Type: Article |
Times cited : (4)
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References (17)
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