Resemblance in gas composition of Ar-N2-O2 plasmas and Ar-NO plasmas

Plasma Sources Science and Technology

Volumn 18, Issue 2, 2009, Pages

  Van Helden, J H ^a,b   Zijlmans, R A B ^a,c   Schram, D C ^a   Engeln, R ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b UNIVERSITY OF OXFORD   (United Kingdom)

^c Sensor Sense BV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON PLASMAS; ASSOCIATION PROCESS; BACKGROUND GAS; FIRST ORDER; GAS COMPOSITIONS; GAS-PHASE REACTIONS; RESIDENCE TIME; THERMODYNAMICALLY STABLE;

ARGON; ASSOCIATION REACTIONS; MASS SPECTROMETRY; MOLECULES; NITRIC OXIDE; PLASMAS;

GASES;

EID: 67649845463     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/18/2/025020     Document Type: Article

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