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Surface and Coatings Technology

Volumn 165, Issue 3, 2003, Pages 296-308

Decomposition of NO in a microwave-absorbent assisted discharge of N2 at atmospheric pressure

(5) Tsuji, Masaharu a Nakano, Kousuke a Kumagae, Jun a Matsuzaki, Toshinori a Tsuji, Takeshi a

a KYUSHU UNIVERSITY (Japan)

Author keywords

Microwave absorbent; Microwave discharge; NO removal; Optical emission spectroscopy

Indexed keywords

ATMOSPHERIC PRESSURE; DECOMPOSITION; ELECTRIC DISCHARGES; MICROWAVES; NITROGEN OXIDES;

SURFACE PHENOMENA;

NITROGEN;

EID: 0037450373 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(02)00752-1 Document Type: Article

Times cited : (11)

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