Erratum: Plasma chemistry aspects of a-Si:H deposition using an expanding thermal plasma (J. Appl. Phys. (1998) 84(5) (2426–2435) (10.1063/1.368977))

Journal of Applied Physics

Volumn 85, Issue 2, 1999, Pages 1243-

  Van de Sanden, M C M ^a   Severens, R J ^a   Kessels, W M M ^a   Meulenbroeks, R F G ^a   Schram, D C ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

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Indexed keywords

EID: 84994455163     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.369257     Document Type: Erratum

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