Direct photoetching of polymers using radiation of high energy density from a table-top extreme ultraviolet plasma source

Journal of Applied Physics

Volumn 105, Issue 1, 2009, Pages

  Barkusky, Frank ^a   Bayer, Armin ^a   Peth, Christian ^a   Mann, Klaus ^a  

^a LASER LABORATORIUM GÖTTINGEN E V   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

13.5 NM; BEAM PROFILING; COMPACT LASERS; DEEP-UV LASERS; DIRECT PHOTO-ETCHING; ETCH DEPTH; ETCH RATES; EUV RADIATION; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET RADIATIONS; FLUENCE; FLUENCE DEPENDENCE; FLUENCES; HIGH ENERGY DENSITIES; HIGHER ENERGY DENSITY; IMAGE PLANE; LINEAR BEHAVIOR; LINEAR DEPENDENCE; MATERIAL INTERACTIONS; MO/SI MULTILAYER; PHOTO-ETCHING; POLYMER ABLATION; POLYMER SURFACES; PULSE DURATIONS; PULSE ENERGIES; PULSE NUMBER; SCHWARZSCHILD; SMOOTH ETCH; STRUCTURED POLYMERS; TABLE-TOP; THRESHOLD ENERGY DENSITY;

ATOMIC FORCE MICROSCOPY; LASER ABLATION; LASER PULSES; MIRRORS; PHOTORESISTS; PLASMA SOURCES; POLYMERS; SURFACE ROUGHNESS;

ULTRAVIOLET DEVICES;

EID: 67649826117     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3054565     Document Type: Article

References (35)

1. R. Srinivasan and S. Lazare, Polymer 0032-3861 10.1016/0032-3861(85) 90302-7 26, 1297 (1985).
2. S. Kueper, S. Modaressi, and M. Stuke, J. Phys. Chem. 0022-3654 10.1021/j100382a038 94, 7514 (1990).
3. R. Srinivasan, J. Appl. Phys. 0021-8979 10.1063/1.353048 73, 2743 (1993).
4. J. Ihlemann and K. Rubahn, Appl. Surf. Sci. 154-155, 587 (2000). 0169-4332
5. T. Lippert and J. T. Dickinson, Chem. Rev. (Washington, D.C.) 0009-2665 10.1021/cr010460q 103, 453 (2003).
6. T. Lippert, Plasma Processes Polym. 1612-8850 10.1002/ppap.200500036 2, 525 (2005).
7. D. A. Tichenor, G. D. Kubiak, M. E. Malinowski, R. H. Stulen, S. J. Haney, K. W. Berger, L. A. Brown, R. R. Freeman, W. M. Mansfield, O. R. Wood II, D. M. Tennant, J. E. Bjorkholm, A. A. MacDowell, J. Bokor, T. E. Jewell, D. L. White, D. L. Windt, and W. K. Waskiewicz, Opt. Lett. 16, 1557 (1991). 0146-9592
8. L. Juha, M. Bittner, D. Chvostova, J. Krasa, Z. Otcenasek, A. R. Präg, J. Ullschmied, Z. Pientka, J. Krzywinski, J. B. Pelka, A. Wawro, M. E. Grisham, G. Vaschenko, C. S. Menoni, and J. J. Rocca, Appl. Phys. Lett. 0003-6951 10.1063/1.1854741 86, 034109 (2005).
9. J. Chalupsk, L. Juha, J. Kuba, J. Cihelka, V. Hájková, S. Koptyaev, J. Krása, A. Velyhan, M. Bergh, C. Caleman, J. Hajdu, R. M. Bionta, H. Chapman, S. P. Hau-Riege, R. A. London, M. Jurek, J. Krzywinski, R. Nietubyc, J. B. Pelka, R. Sobierajski, J. Meyer-ter-Vehn, A. Tronnier, K. Sokolowski-Tinten, N. Stojanovic, K. Tiedtke, S. Toleikis, T. Tschentscher, H. Wabnitz, and U. Zastrau, Opt. Express 1094-4087 10.1364/OE.15.006036 15, 6036 (2007).
10. T. Mocek, B. Rus, M. Stupka, M. Kozlová, A. R. Präg, J. Polan, M. Bittner, R. Sobierajski, and L. Juha, Appl. Phys. Lett. 0003-6951 10.1063/1.2260822 89, 051501 (2006).
11. M. C. K. Tinone, K. Tanaka, J. Maruyama, N. Ueno, M. Imamura, and N. Matsubayashi, J. Chem. Phys. 0021-9606 10.1063/1.467274 100, 5988 (1994).
12. M. Wei, D. T. Attwood, T. K. Gustafson, and E. H. Anderson, J. Vac. Sci. Technol. B 1071-1023 10.1116/1.587632 12, 3648 (1994).
13. K. Tanaka, M. C. K. Tinone, H. Ikeura, T. Sekiguchi, and T. Sekitani, Rev. Sci. Instrum. 0034-6748 10.1063/1.1145945 66, 1474 (1995).
14. Y. Zhang, T. Katoh, M. Washio, H. Yamada, and S. Hamada, Appl. Phys. Lett. 67, 872 (1995).
15. M. Inayoshi, M. Ikeda, M. Hori, T. Goto, M. Hiramatsu, and A. Hiraya, Jpn. J. Appl. Phys., Part 2 0021-4922 10.1143/JJAP.34.L1675 34, L1675 (1995).
16. Y. Zhang and T. Katoh, Jpn. J. Appl. Phys., Part 2 0021-4922 10.1143/JJAP.35.L186 35, L186 (1996).
17. A. Bartnik, H. Fiedorowicz, R. Jarocki, L. Juha, J. Kostecki, R. Rakowski, and M. Szczurek, Appl. Phys. B: Lasers Opt. 82, 529 (2006). 0946-2171
18. F. Barkusky, C. Peth, A. Bayer, and K. Mann, J. Appl. Phys. 0021-8979 10.1063/1.2749210 101, 124908 (2007).
19. H. Fiedorowicz, A. Bartnik, K. Jakubczak, R. Jarocki, and L. Juha, Proc. SPIE 6598, G5980 (2007). 0277-786X
20. T. Makimura, H. Miyamoto, Y. Kenmotsu, and K. Murakami, Appl. Phys. Lett. 0003-6951 10.1063/1.1882750 86, 103111 (2005).
21. F. Barkusky, A. Bayer, C. Peth, and K. Mann, Proc. SPIE 6879, 6879M (2008). 0277-786X
22. S. Kranzusch and K. Mann, Opt. Commun. 0030-4018 10.1016/S0030-4018(01) 01639-X 200, 223 (2001).
23. C. Peth, S. Kranzusch, K. Mann, and W. Viöl, Rev. Sci. Instrum. 0034-6748 10.1063/1.1791314 75, 3288 (2004).
24. S. Kranzusch, C. Peth, and K. Mann, Rev. Sci. Instrum. 0034-6748 10.1063/1.1532835 74, 969 (2003).
25. Center for X-Ray Optics, Berkeley Laboratory, http://www-cxro.lbl.gov/.
26. F. Barkusky, C. Peth, K. Mann, T. Feigl, and N. Kaiser, Rev. Sci. Instrum. 0034-6748 10.1063/1.2072147 76, 105102 (2005).
27. B. Schäfer and K. Mann, Appl. Opt. 0003-6935 10.1364/AO.41.002809 41, 2809 (2002).
28. B. Schäfer and K. Mann, Rev. Sci. Instrum. 0034-6748 10.1063/1.1150673 71, 2663 (2000).
29. R. C. Spitzer, R. L. Kauffman, T. Orzechowski, D. W. Phillion, and C. Cerjan, J. Vac. Sci. Technol. B 1071-1023 10.1116/1.586573 11, 2986 (1993).
30. L. Juha, M. Bittner, D. Chvostova, V. Letal, J. Krasa, Z. Otcenasek, M. Kozlova, J. Polan, A. R. Präg, B. Rus, M. Stupka, J. Krzywinski, A. Andrejczuk, J. B. Pelka, R. Sobierajski, L. Ryc, J. Feldhaus, F. P. Boody, M. E. Grisham, G. O. Vaschenko, C. S. Menoni, and J. J. Rocca, J. Electron Spectrosc. Relat. Phenom. 144-147, 929 (2005).
31. T. A. Johnson, R. Soufli, E. M. Gullikson, and M. Clift, Proc. SPIE 5538, 119 (2004). 0277-786X
32. L. D. Laude, D. Martinez, Cl. Dicara, Fr. Hanus, and K. Kolev, Nucl. Instrum. Methods Phys. Res. B 185, 147 (2001). 0277-786X
33. M. Bergh, Interaction of Ultrashort X-ray Pulses with Material, Doctoral Thesis (Upsala University, Interfaculty Units, Acta Universitatis Upsaliensis, 2007).
34. A. Costela, I. Garcia Moreno, F. Florido, and J. M. Figura, J. Appl. Phys. 0021-8979 10.1063/1.358756 77, 2343 (1995).
35. E. W. Kreutz, H. Frerichs, J. Stricker, and D. A. Wesner, Nucl. Instrum. Methods Phys. Res. B 105, 245 (1995). 0021-8979