XUV-laser induced ablation of PMMA with nano-, pico-, and femtosecond pulses

Journal of Electron Spectroscopy and Related Phenomena

Volumn 144-147, Issue , 2005, Pages 929-932

  Juha, L ^a   Bittner, M ^a,b   Chvostova, D ^a   Letal, V ^d   Krasa, J ^a   Otcenasek, Z ^a,d   Kozlova, M ^a   Polan, J ^a   Prag A R ^a   Rus, B ^a   Stupka, M ^a   Krzywinski, J ^c,e   Andrejczuk, A ^c,f   Pelka, J B ^c,e   Sobierajski, R ^g   Ryc, L ^h   Feldhaus, J ^c   Boody, F P ⁱ   Grisham, M E ^j   Vaschenko, G O ^j   Menoni, C S ^j   Rocca, J J ^j   more..

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b CHARLES UNIVERSITY   (Czech Republic)

^c DESY   (Germany)

^d CZECH TECHNICAL UNIVERSITY IN PRAGUE   (Czech Republic)

^e INSTITUTE OF PHYSICS   (Poland)

^f UNIVERSITY OF BIALYSTOK   (Poland)

^g WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

^h SOLTAN INSTITUTE FOR NUCLEAR STUDIES   (Poland)

ⁱ Ion Light Technologies GmbH   (Germany)

^j Department of Environmental and Radiological Health Sciences   (United States)

more..

Author keywords

Ablation; PMMA; Poly(methyl methacrylate); Pulse duration effects; Soft X ray lasers; Wavelength effects; XUV lasers

Indexed keywords

ABLATION; ATOMIC FORCE MICROSCOPY; LASER APPLICATIONS; LASER PULSES; SCANNING; SILICON WAFERS; ULTRAVIOLET RADIATION;

PULSE DURATION EFFECTS; SOFT X-RAY LASERS; WAVELENGTH EFFECTS; XUV LASERS;

POLYMETHYL METHACRYLATES;

EID: 20244378085     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2005.01.258     Document Type: Conference Paper

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