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Volumn 5538, Issue , 2004, Pages 119-124

Zirconium and niobium transmission data at wavelengths from 11-16 nm and 200-1200 nm

Author keywords

EUVL; Extreme ultraviolet lithography; Niobium; Optical constants; Optical filters; Zirconium

Indexed keywords

ELECTROFORMING; LASER PRODUCED PLASMAS; LIGHT TRANSMISSION; NICKEL; NIOBIUM; OXIDATION; PHOTOLITHOGRAPHY; REFRACTIVE INDEX; SUBSTRATES; ULTRAVIOLET RADIATION; X RAYS; XENON; ZIRCONIUM;

EID: 15844412607     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.564259     Document Type: Conference Paper
Times cited : (8)

References (8)
  • 1
    • 0034768310 scopus 로고    scopus 로고
    • Filter windows for EUV lithography
    • F. R. Powell and T. A. Johnson, "Filter windows for EUV lithography," Proceedings of SPIE, 4343, 585-589, 2001.
    • (2001) Proceedings of SPIE , vol.4343 , pp. 585-589
    • Powell, F.R.1    Johnson, T.A.2
  • 2
    • 0033725373 scopus 로고    scopus 로고
    • EUV engineering test stand
    • D. A. Tichenor et al., "EUV Engineering Test Stand," Proceedings of SPIE, 3997, 48-69, 2000.
    • (2000) Proceedings of SPIE , vol.3997 , pp. 48-69
    • Tichenor, D.A.1
  • 3
    • 0344440777 scopus 로고    scopus 로고
    • System integration and performance of the EUV engineering test stand
    • D. A. Tichenor et al., "System Integration and Performance of the EUV Engineering Test Stand," Proceedings of SPIE, 4343, 19-37, 2001.
    • (2001) Proceedings of SPIE , vol.4343 , pp. 19-37
    • Tichenor, D.A.1
  • 5
    • 0036902092 scopus 로고    scopus 로고
    • Measurements of the refractive index of yttrium in the 50-1300-eV energy region
    • B. Sae-Lao and R. Soufli, "Measurements of the refractive index of yttrium in the 50-1300-eV energy region," Applied Optics, 41, 7309-7316, 2002.
    • (2002) Applied Optics , vol.41 , pp. 7309-7316
    • Sae-Lao, B.1    Soufli, R.2
  • 6
    • 0001593228 scopus 로고    scopus 로고
    • Absolute photoabsorption measurements of molybdenum in the range 60-930 eV for optical constant determination
    • R. Soufli and E. M. Gullikson, "Absolute photoabsorption measurements of molybdenum in the range 60-930 eV for optical constant determination," Applied Optics, 37, 1713-1719, 1998.
    • (1998) Applied Optics , vol.37 , pp. 1713-1719
    • Soufli, R.1    Gullikson, E.M.2
  • 7
    • 84975624241 scopus 로고
    • Optical constants for thin films of Ti, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Hf, Ta, W, Re, Ir, Os, Pt, and Au from 24 A to 1216 A
    • D. L. Windt et al., "Optical constants for thin films of Ti, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Hf, Ta, W, Re, Ir, Os, Pt, and Au from 24 A to 1216 A," Applied Optics, 27, 246-278, 1988.
    • (1988) Applied Optics , vol.27 , pp. 246-278
    • Windt, D.L.1
  • 8
    • 4243813128 scopus 로고
    • Optical properties of niobium from 0.1 to 36.4 eV
    • J. H. Weaver, D. W. Lynch, and C. G. Olson, "Optical Properties of Niobium from 0.1 to 36.4 eV," Physical Review B, 7,4311-4318, 1973.
    • (1973) Physical Review B , vol.7 , pp. 4311-4318
    • Weaver, J.H.1    Lynch, D.W.2    Olson, C.G.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.