Effects of the post-annealing ambience on the microstructure and optical properties of tantalum oxide films prepared by pulsed laser deposition

Journal of Alloys and Compounds

Volumn 478, Issue 1-2, 2009, Pages 453-457

  He, Xiliang ^a,b   Wu, Jiehua ^a   Li, Xiaomin ^a   Gao, Xiangdong ^a   Gan, Xiaoyan ^a,b   Zhao, Lili ^a  

^a SHANGHAI INSTITUTE OF CERAMICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Crystal structure; Optical properties; Post annealing; Tantalum oxide films

Indexed keywords

ANNEALED FILMS; ANNEALING TEMPERATURES; CRYSTALLINITY; ORTHORHOMBIC STRUCTURES; OXYGEN PRESSURES; PEAK VALUES; POLYCRYSTALLINE STRUCTURES; POST-ANNEALING; RMS ROUGHNESS; ROOT-MEAN-SQUARE ROUGHNESS; SCATTERING LOSS; TANTALUM OXIDE FILMS; THEORETICAL VALUES;

ANNEALING; CRYSTAL STRUCTURE; ENERGY GAP; INSTRUMENT SCALES; OPTICAL BAND GAPS; OPTICAL PROPERTIES; OXYGEN; PULSED LASER DEPOSITION; STRUCTURAL PROPERTIES; TANTALUM; TANTALUM COMPOUNDS; TRANSITION METALS;

OXIDE FILMS;

EID: 67349207936     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.11.077     Document Type: Article

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