TiO2 - Ta2O5 composite thin films deposited by radio frequency ion-beam sputtering

Applied Optics

Volumn 45, Issue 36, 2006, Pages 9125-9131

  Lee, Cheng Chung ^a   Tang, Chien Jen ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; NATURAL FREQUENCIES; RESIDUAL STRESSES; SPUTTERING; SURFACE ROUGHNESS; TANTALUM COMPOUNDS; TITANIUM DIOXIDE;

COMPOSITE FILMS; EXTINCTION COEFFICIENTS; ION-BEAM SPUTTERING;

THIN FILMS;

EID: 33846858835     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.45.009125     Document Type: Article

References (25)

1. W. H. Wang and S. Chao, "Annealing effect on ion-beam-sputtered titanium dioxide film," Opt. Lett. 23, 1417-1419 (1998).
2. J. C. Hsu and C. C. Lee, "Single- and dual-ion-beamsputter deposition of titanium oxide films," Appl. Opt. 37, 1171-1176 (1998).
3. 2 films produced by ion-assisted deposition," Appl. Opt. 44, 2996-3009 (2005).
4. L. S. Hsu, R. Rujkorakarn, J. R. Sites, and C. Y. She, "Thermally induced crystallization of amorphous-titania films," J. Appl. Phys. 59, 3475-3480 (1986).
5. M. R. Kozlowski, "Damage-resistant laser coating," in Thin Films for Optical System, F. R. Flory, ed. (Dekker, 1995), pp. 521-549.
6. 2 mixed films," J. Opt. Soc. Am. A 16, 1477-1483 (1999).
7. 2 mixed films," Appl. Opt. 40, 2177-2182 (2001).
8. E. Feldman, N. Farabaugh, W. K. Haller, D. M. Sanders, and R. A. Stempniak, "Modifying structure and properties of optical films by coevaporation," J. Vac. Sci. Technol. A 6, 2969-2974 (1986).
9. H. Sankur, W. J. Gunning, and J. F. DeNatale, "Intrinsic stress and structural properties of mixed composition thin film," Appl. Opt. 27, 1564-1567 (1988).
10. B. J. Pond, J. I. DeBar, C. K. Carniglia, and T. Raj, "Stress reduction in ion beam sputtered mixed oxide films," Appl. Opt. 28, 2800-2805 (1989).
11. 2 mixed films prepared by the fast alternating sputter method," Appl. Opt. 30, 3233-3237 (1991).
12. 2 deposited by double electron-beam Coevaporation," Appl. Opt. 35, 90-96 (1996).
13. 5 composite thin films deposited by coevaporation," Opt. Eng. 39, 3207-3213 (2000).
14. M. Veszelei, L. Kullman, C. G. Granqvist, N. von Rottkay, and M. Rubin, "Optical constants of sputter-deposited Ti-Ce oxide and Zr-Ce oxide films," Appl. Opt. 37, 5993-6001 (1998).
15. 2 composite films synthesized by helicon plasma sputtering," Thin Solid Films 338, 105-109 (1999).
16. x layers prepared by magnetron sputtering from separate metal targets," Surf. Coat. Technol. 174-175, 651-654 (2003).
17. 1-x composite thin films," Thin Solid Films 258, 91-103 (1995).
18. C. C. Lee, C. J. Tang, and J. Y. Wu, "Rugate filter made with composite thin films by ion-beam sputtering," Appl. Opt. 45, 1333-1337 (2006).
19. J. C. Manifacier, J. Gasiot, and J. P. Fillard, "A simple method for the determination, of the optical constant n, k and the thickness of the weakly absorbing thin film," J. Phys. E 9, 1002-1004 (1976).
20. G. G. Stoney, "The tension of metallic films deposited by electrolysis," Proc. R. Soc. London Ser. A 82, 172-175 (1909).
21. J. Chastain and R. C. King, Handbook of X-ray Photoelectron Spectroscopy (Physical Electronics, 1995), pp. 44-45, 72-73, and 170-171.
22. D. R. Lide, CRC Handbook of Chemistry and Physics, 82nd ed. (CRC Press, 2001).
23. D. E. Aspnes, "Local-field effects and effective-medium theory: A microscopic perspective," Am. J. Phys. 50, 704-709 (1982).
24. G. A. Niklasson, C. G. Granqvist, and O. Hunderi, "Effective medium models for the optical properties of inhomogeneous materials," Appl. Opt. 20, 26-30 (1981).
25. H. Windischmann, "An intrinsic stress scaling law for polycrystalline thin films prepared by ion beam sputtering," J. Appl. Phys. 62, 1800-1807 (1987).