Metallorganic chemical vapor deposition of Ta2O5 films

Journal of the European Ceramic Society

Volumn 23, Issue 2, 2003, Pages 247-251

  Porporati, A ^a   Roitti, S ^a   Sbaizero, O ^a  

^a UNIVERSITY OF TRIESTE   (Italy)

Author keywords

CVD; Dielectric properties; Films; Ta2O5

Indexed keywords

FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PERMITTIVITY; REFRACTIVE INDEX; SOLUTIONS;

PRECURSOR SOLUTIONS;

TANTALUM COMPOUNDS;

FILM;

EID: 0037292199     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0955-2219(02)00184-X     Document Type: Article

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