Optical properties and deposition rate of sputtered Ta2O 5 films deposited by ion-beam oxidation

Thin Solid Films

Volumn 483, Issue 1-2, 2005, Pages 130-135

  Lee, Cheng Chung ^a   Jan, Der Jun ^a,b  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b INSTITUTE OF NUCLEAR ENERGY RESEARCH   (Taiwan)

Author keywords

Ion bombardment; Optical properties; Tantalum

Indexed keywords

CHEMICAL BONDS; COMPOSITION; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED RADIATION; ION BOMBARDMENT; LIGHT ABSORPTION; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OXIDATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TANTALUM; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOM DEPOSITION; CHEMICAL BONDING; DEPOSITION RATE; ION-BEAM OXIDATION;

THIN FILMS;

EID: 18844413242     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.12.050     Document Type: Article

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