Electrical and optical characteristics of Ta 2 O 5 thin films deposited by electron-beam vapor deposition

Plasma Processes and Polymers

Volumn 3, Issue 2, 2006, Pages 174-178

  Todorova, Zhana ^a   Donkov, Nikolay ^a   Ristić, Zoran ^b   Bundaleski, Nenad ^b   Petrović, Suzana ^b   Petkov, Mario ^a  

^a INSTITUTE OF ELECTRONICS   (Bulgaria)

^b UNIVERSITY OF BELGRADE   (Serbia)

Author keywords

Deposition; Optical properties; Oxidation; Ta 2 O 5; Thin films

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC PROPERTIES; ELECTRON BEAMS; OPTICAL PROPERTIES; OXIDATION; PLASMA PROBES; SUBSTRATES; THIN FILMS;

ELECTRICAL CHARACTERISTICS; ELECTRON-BEAM VAPOR DEPOSITION; OPTICAL CHARACTERISTICS;

TANTALUM COMPOUNDS;

EID: 33644527901     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200500110     Document Type: Article

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