Variation of the deposition rate during ion beam sputter deposition of optical thin films

Thin Solid Films

Volumn 484, Issue 1-2, 2005, Pages 170-173

  Liu, Hongxiang ^a   Xiong, Shengming ^a   Li, Linghui ^a   Zhang, Yundong ^a  

^a INSTITUTE OF OPTICS AND ELECTRONICS   (China)

Author keywords

Optical coatings; Optical properties; Sputtering; Tantalum oxide

Indexed keywords

ION BEAM ASSISTED DEPOSITION; OPTICAL COATINGS; OPTICAL PROPERTIES; SPUTTER DEPOSITION; TANTALUM COMPOUNDS; THIN FILMS;

DEPOSITION RATES; FILM LAYERS; OPTICAL THICKNESS; TANTALUM OXIDES;

OPTICAL FILMS;

EID: 19944369443     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.02.041     Document Type: Article

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