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Volumn 48, Issue 11, 2001, Pages 2525-2534

A complementary bipolar technology family with a vertically integrated PNP for high-frequency analog applications

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; ELECTRIC BREAKDOWN; INTEGRATED CIRCUIT LAYOUT; MICROELECTRONIC PROCESSING; OPTIMIZATION; PERFORMANCE; POLYCRYSTALLINE MATERIALS; RESISTORS; SEMICONDUCTING SILICON;

EID: 6644230373     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.960378     Document Type: Article
Times cited : (22)

References (62)
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    • 4243260745 scopus 로고
    • Compatible, high performance complementary bipolar transistors for integrated circuits
    • (1969) IEDM Tech. Dig. , pp. 82
    • Polata, B.1
  • 5
    • 0006686653 scopus 로고
    • A triple diffused process for the simultaneous fabrication of NPN, PNP, and MOS devices in isolated P and N type regions
    • (1975) U.S. Patent 3 865 649
    • Beasom, J.D.1
  • 47
  • 51
    • 0026204391 scopus 로고
    • Unified minority-carrier transport equation for polysilicon or heteromaterial emitter contact bipolar transistors
    • Aug
    • (1991) IEEE Trans. Electron Devices , vol.38 , pp. 1868-1877
    • Suzuki, K.1
  • 57
    • 0006753363 scopus 로고
    • Optimized high rate deep silicon trench etching for dielectric isolation in smart power devices
    • (1994) ECS Ext. Abstr. , pp. 336
    • Engelhardt, M.1
  • 59
    • 0031232690 scopus 로고    scopus 로고
    • Low-power, high-speed, current-feedback op-amp with a novel class AB high current output stage IEEE
    • Sep
    • (1997) J. Solid-State Circuits , vol.32 , pp. 1470-1474
    • Bales, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.