Trench isolation technology for high-performance complementary bipolar devices

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2875, Issue , 1996, Pages 48-61

  Brown, Kevin C ^a   Bracken, Chris ^a   Bashir, Rashid ^a   Egan, Kulwant ^a   DeSantis, Joe ^a   Kabir, Abul E ^a   Yindeepol, Wipawan ^a   McGregor, Joel ^a   Prasad, S J ^a   Razouk, Reda ^a   Boksha, Victor V ^a   Rey, Juan C ^a  

^a NATIONAL SEMICONDUCTOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN; ETCHING; PERFORMANCE; PLASMAS; SEMICONDUCTING SILICON; TECHNOLOGY;

TRENCH ISOLATION; WAFER PROCESSING;

BIPOLAR TRANSISTORS;

EID: 0030414846     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.250883     Document Type: Conference Paper

References (28)