Deep dry etching of SOI for silicon micromachined structures

IEEE International SOI Conference

Volumn , Issue , 1997, Pages 60-61

  McNie, M E ^a   King, D O ^a   Nayar, V ^a   Ward, M C L ^a   Burdess, J S ^a   Quinn, C ^a   Blackstone, S ^a  

^a DEFENCE SCIENCE AND TECHNOLOGY LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ASPECT RATIO; DIELECTRIC MATERIALS; DRY ETCHING; MICROMACHINING; SEMICONDUCTOR DEVICE STRUCTURES; SILICON WAFERS; SUBSTRATES;

ADVANCED SILICON ETCH (ASE); SILICON MICROMACHINED STRUCTURES;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0031336938     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)