Evidence for H2 at high pressure in the silicon nanocavities after dipping in HF solution

Surface Science

Volumn 603, Issue 14, 2009, Pages 2188-2192

  Romano, E ^a   Cerofolini, G F ^a   Narducci, D ^a   Corni, F ^b   Frabboni, S ^b   Ottaviani, G ^b   Tonini, R ^b  

^a UNIVERSITY OF MILANO BICOCCA   (Italy)

^b UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

Author keywords

Adsorption and desorption at high H2 pressure; Hydrogen injection via wet chemistry; MIR infrared spectroscopy; Nanocavities in silicon

Indexed keywords

FLUENCE; HF SOLUTIONS; HIGH PRESSURE; HIGH TEMPERATURE; HYDROGEN INJECTION VIA WET CHEMISTRY; INNER SURFACES; MIR INFRARED SPECTROSCOPY; NANO-CAVITIES; NANOCAVITIES IN SILICON; OUTER SURFACE;

ADSORPTION; DESORPTION; FUEL INJECTION; HELIUM; HYDROFLUORIC ACID; HYDROGEN; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS;

INFRARED SPECTROSCOPY;

EID: 66249132728     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2009.04.017     Document Type: Article

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