An example of chemistry-morphology interaction: Making up for the geometric and energetic heterogeneities of the (1 0 0) surface of single crystalline silicon by high-temperature treatments in H2

Applied Surface Science

Volumn 252, Issue 3, 2005, Pages 602-611

  Cerofolini, G F ^a   Galati, C ^a   Reina, S ^a   Renna, L ^a   Jones, D ^b   Palermo, V ^b  

^a STMICROELECTRONICS   (Italy)

^b CNR   (Italy)

Author keywords

Infrared absorption spectroscopy; Thermal programmed desorption; X ray photoelectron spectroscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; HIGH ENERGY ELECTRON DIFFRACTION; HYDROGEN; MORPHOLOGY; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMISTRY-MORPHOLOGY INTERACTION; INFRARED ABSORPTION SPECTROSCOPY; SILICON SURFACES; THERMAL PROGRAMMED DESORPTION;

SILICON;

EID: 26444574263     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.02.074     Document Type: Article

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