Study of interfacial reactions and phase stabilization of mixed Sc, Dy, Hf high-k oxides by attenuated total reflectance infrared spectroscopy

Applied Surface Science

Volumn 255, Issue 17, 2009, Pages 7812-7817

  Hardy, A ^a,b   Adelmann, C ^b   Van Elshocht, S ^b   Van den Rul, H ^a,b   Van Bael, M K ^a,b   De Gendt, S ^b,d   D'Olieslaeger, M ^b,c   Heyns, M ^b,d   Kittl, J A ^b   Mullens, J ^a  

^a HASSELT UNIVERSITY   (Belgium)

^b IMEC   (Belgium)

^c HASSELT UNIVERSITY   (Belgium)

^d UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

ATR FTIR; Hafnia; High permittivity; Rare earth; Scandate

Indexed keywords

DYSPROSIUM COMPOUNDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HIGH-K DIELECTRIC; LOW-K DIELECTRIC; PERMITTIVITY; RARE EARTHS; REFLECTION; SEMICONDUCTOR DOPING; SILICA; SILICATES; ULTRATHIN FILMS;

ATR FTIR; ATTENUATED TOTAL REFLECTANCE FOURIER TRANSFORM INFRARED SPECTROSCOPY; ATTENUATED TOTAL REFLECTANCE INFRARED SPECTROSCOPY; HAFNIA; HIGH PERMITTIVITY; PHASE STABILIZATION; SCANDATES; SURFACE SENSITIVITY;

HAFNIUM OXIDES;

EID: 66049132581     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.04.184     Document Type: Article

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