Liquid injection MOCVD of dysprosium scandate films

Journal of the Electrochemical Society

Volumn 154, Issue 7, 2007, Pages

  Thomas, Reji ^a   Ehrhart, Peter ^a   Roeckerath, Martin ^a   Van Elshocht, Sven ^b   Rije, Eduard ^a   Luysberg, Martina ^a   Boese, Markus ^a   Schubert, Juergen ^a   Caymax, Matty ^b,c   Waser, Rainer ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b IMEC   (Belgium)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; DYSPROSIUM COMPOUNDS; GROWTH RATE; LEAKAGE CURRENTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; STOICHIOMETRY;

BULK CRYSTALLINE DENSITY; INJECTION RATE; LIQUID INJECTION; METAL PRECURSORS; REACTOR PRESSURE; SUSCEPTOR TEMPERATURES;

THIN FILMS;

EID: 34249901778     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2731299     Document Type: Article

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