Interfacial reactions and silicate formation in highly dispersed Nd 2O3-SiO2 system

Materials Chemistry and Physics

Volumn 96, Issue 2-3, 2006, Pages 353-360

  Kȩpiński, Leszek ^a   Wołcyrz, Marek ^a   Drozd, Marek ^a  

^a INSTITUTE OF LOW TEMPERATURE AND STRUCTURE RESEARCH   (Poland)

Author keywords

Chemical synthesis; Electron microscopy; Microstructure; Oxides

Indexed keywords

AMORPHOUS MATERIALS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTERFACES (MATERIALS); SILICA; SILICATES; SYNTHESIS (CHEMICAL); THICK FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY POWDER DIFFRACTION; ZINC OXIDE;

HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY (HRTEM); SOLID-STATE INTERFACE REACTIONS;

NEODYMIUM COMPOUNDS;

EID: 31644433515     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2005.07.026     Document Type: Article

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