Adamantane-based molecular glass resist for 193-nm lithography and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Tanaka, Shinji ^a   Matsumoto, Nobuaki ^a   Ohno, Hidetoshi ^a   Hatakeyama, Naoyoshi ^b   Ito, Katsuki ^a   Fukushima, Kazuya ^a   Oizumi, Hiroaki ^c   Nishiyama, Iwao ^c  

^a IDEMITSU KOSAN CO LTD   (Japan)

^b Idemitsu Chemicals USA Corp   (United States)

^c ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

193 nm; Adamantane; EUV; Molecular glass resist; Refractive index; Roughness; Transparency

Indexed keywords

GLASS; LIGHT REFRACTION; LIGHT WATER REACTORS; LITHOGRAPHY; OPTICAL PROPERTIES; PHOTORESISTS; POLYMERS; REFRACTIVE INDEX; REFRACTOMETERS; ROUGHNESS MEASUREMENT; SURFACE ROUGHNESS; TRANSPARENCY; ULTRAVIOLET DEVICES;

193 NM; ADAMANTANE; EUV; MOLECULAR GLASS RESIST; ROUGHNESS;

POLYMERIC GLASS;

EID: 57349098658     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772249     Document Type: Conference Paper

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