Novel 193-nm positive photoresist composed of ester acetal polymer without phenyl group

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 2, 2007, Pages

  Wang, Liyuan ^a   Zhai, Xiaoxiao ^a   Huo, Yongen ^a  

^a BEIJING NORMAL UNIVERSITY   (China)

Author keywords

1,3 adamantanedicarboxylic acid; 193nm positive photoresist; Acrylpimaric acid; Divinyl ether; Ester acetal polymer; PAG

Indexed keywords

CARBOXYLIC ACIDS; DECOMPOSITION; ESTERS; ETHERS; NANOPARTICLES; PHOTOPOLYMERIZATION; TRANSPARENCY;

1,3-ADAMANTANEDICARBOXYLIC ACID; 193NM POSITIVE PHOTORESISTS; ACRYLPIMARIC ACID; DIVINYL ETHERS;

PHOTORESISTS;

EID: 35148880747     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711703     Document Type: Conference Paper

References (13)

1. K. Tsuchiya, Y. Shibasaki, M. Ueda; Polymer, 2004, 45, 6873-6878
2. S. Noppakundilograt, N. Miyagawa, S. Takahara, et al; Journal of Photopolymer Science and Technology, 2000, 13(5), 719-722
3. S. Moon, J. Koo, S.Oh, et al; Journal of Photopolymer Science and Technology, 1998, 11(3), 439-444
4. S. Moon, K. Kamenosono, S. Kondo, et al; Chem. Mater., 1994, 6, 1854-1860
5. H. Watanabe, K. Maeshima, T. Aoai, et al; Journal of Photopolymer Science and Technology, 1998, 11(3), 537-540
6. Liyuan Wang, Xin Guo, Zhanxing Chu; Proc. SPIE, 6153, 615329, 2006
7. S. Takechi, Y. Kaimoto, K. Nozaki, et al; J. Photopolym. Sci. Technol, 5, 439, 1992
8. S. Iwasa, K. Maeda and E. Hasegawa; J. Photopolym. Sci. Technol, 12, 487, 1999
9. Y. Kamon, H. Momose, H. Kuwano, et al; Proc. SPIE, 4690,615,2002
10. Hui Xie, Zhi Cheng; Chemistry and Industry of Forest Product, 1998, 18(3), 67-73
11. Noah J. Halbrook, Ray V. Lawrence, Robert L. Dressier, et al, J.O.C.(1964), 29,5, 1017-21
12. L.N. Butenko, P.A. Protopopov, V.E. Derbisher, et al, Synthetic Communications, 14(2), 113-19, 1984
13. Wenjun Wang, Huamin Li, Liyuan Wang;Photographic Science and Photochemistry, 2005, 23(1), 48-54