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Volumn 311, Issue 10, 2009, Pages 2914-2918
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Maskless selective growth of semi-polar (1 12̄ 2) GaN on Si (3 1 1) substrate by metal organic vapor phase epitaxy
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Author keywords
A1. Defects; A3. Metalorganic vapor phase epitaxy; A3. Selective epitaxy; B1. Nitrides; B2. Semiconducting III V materials
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Indexed keywords
A1. DEFECTS;
A3. METALORGANIC VAPOR PHASE EPITAXY;
A3. SELECTIVE EPITAXY;
B1. NITRIDES;
B2. SEMICONDUCTING III-V MATERIALS;
COALESCENCE;
CRYSTAL DEFECTS;
CRYSTAL GROWTH;
EMISSION SPECTROSCOPY;
GALLIUM ALLOYS;
GALLIUM NITRIDE;
ORGANIC CHEMICALS;
ORGANOMETALLICS;
SEMICONDUCTING GALLIUM;
SEMICONDUCTING SILICON COMPOUNDS;
SEMICONDUCTOR GROWTH;
SILICON;
SIZE DISTRIBUTION;
SUBSTRATES;
VAPORS;
METALLORGANIC VAPOR PHASE EPITAXY;
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EID: 65749103613
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2009.01.064 Document Type: Article |
Times cited : (16)
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References (20)
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