Surface HCl treatment in ZnO photoconductive sensors

Thin Solid Films

Volumn 517, Issue 17, 2009, Pages 5050-5053

  Chang, S P ^a   Chuang, R W ^a,b   Chang, S J ^a   Lu, C Y ^a   Chiou, Y Z ^c   Hsieh, S F ^d  

^a Center for Micro/Nano Science and Technology   (Taiwan)

^b NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^c SOUTHERN TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^d NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

1 f noise; Photoconductive sensor; Responsivity; Surface treatment; ZnO

Indexed keywords

1/F NOISE; APPLIED BIAS; ETCHING PROCESS; FABRICATED SENSORS; HCL SOLUTION; HIGH-FREQUENCY NOISE; INCIDENT LIGHT; LOW FREQUENCY; PHOTO DETECTION; PHOTOCONDUCTIVE SENSOR; PHOTOCONDUCTIVE SENSORS; RESPONSIVITY; SAPPHIRE SUBSTRATES; ZNO;

CORUNDUM; HYDROCHLORIC ACID; PHOTOCONDUCTIVITY; SEMICONDUCTING ZINC COMPOUNDS; SENSORS; SPURIOUS SIGNAL NOISE; SURFACE ROUGHNESS; ZINC OXIDE;

SURFACE TREATMENT;

EID: 65649131618     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.03.042     Document Type: Article

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